X-ray silicon nitride membrane_X-Ray windows_silicon nitride membrane_YW MEMS

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X-ray silicon nitride membrane

YW MEMS’s silicon nitride membrane is an ideal biological sample support membrane for scanning transmission soft X-ray microscopy (STXM). The STXM technology in the synchrotron radiation source can be used for spatial and chemical analysis of biological samples in their natural state at the sub-micron level. It can also be used as a vacuum window to separate the high vacuum soft X-ray from atmospheric pressure for biological living cell research, and as a pollution barrier layer in the synchrotron radiation beam line.

Model introduction Purchase link Operating instructions Customized services

PRODUCT FEATURES

High X-ray transmittance

nano-thick silicon nitride membrane has extremely low X-ray absorption;

Ultra-flat surface

surface roughness <0.5nm, refocusing frequency can be reduced when the window is scaned in a large area；

Ultra-clean surface

cells, fibers and particles, etc. can be directly transferred to the film for inspection；

Good chemical stability

the film is resistant to acid and alkali corrosion; resistant to various culture and chemical cleaning solutions；

High mechanical strength

the surface of the membrane can be micro-nano-processed；

High quality assurance

piece-by-piece inspection under light microscopy, strictly control the quality；

Product parameters

Prod.#
Nitride thickness (nm)
Window size (mm)
Frame size (mm)
Substrate Thickness (μm)
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TE025Z
10
0.25x0.25
5x5
200

TE050Z
10
0.5x0.5
5x5
200

TE025Y
20
0.25x0.25
5x5
200

TE050Y
20
0.5x0.5
5x5
200

TE025A
30
0.25x0.25
5x5
200

TE050A
30
0.5x0.5
5x5
200

TE100A
30
1x1
5x5
200

TE025B
50
0.25x0.25
5x5
200

TE050B
50
0.5x0.5
5x5
200

TE100B
50
1x1
5x5
200

TE150B
50
1.5x1.5
5x5
200

TE200B
50
2x2
5x5
200

TE010C
100
0.1x0.1
5x5
200

TE025C
100
0.25x0.25
5x5
200

TE050C
100
0.5x0.5
5x5
200

TE100C
100
1x1
5x5
200

TE150C
100
1.5x1.5
5x5
200

TE200C
100
2x2
5x5
200

TE75050C
100
0.5x0.5
7.5x7.5
200

TE75200C
100
2x2
7.5x7.5
200

TE100300C（5pcs）
100
3x3
10x10
200

TE100500C（5pcs）
100
5x5
10x10
200

TE010D
200
0.1x0.1
5x5
200

TE025D
200
0.25x0.25
5x5
200

TE050D
200
0.5x0.5
5x5
200

TE100D
200
1x1
5x5
200

TE150D
200
1.5x1.5
5x5
200

TE200D
200
2x2
5x5
200

TE250D
200
2.5x2.5
5x5
200

10 pcs in each pack（except TE100300C and TE100500C）

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SILICON NITRIDE MEMBRANE STRUCTURE DIAGRAM AND PARAMETER

Frame
Parameter
Frame
Parameter

Material
N/P type silicon
Resistivity
1~10Ω*cm

Silicon nitride
Parameter
Silicon nitride
Parameter

Material
LPCVD silicon nitride
Stress
<250MPa

Dielectric constant
6-7
Dielectric strength
10（10⁶V/cm）

Resistivity
10¹⁶Ω*cm
Roughness（Pa）
0.28±5%nm

Refractive index@630nm
2.15-2.17
Roughness（Rms）
0.45±5%nm

case show

As biology and cell carrier

As biology and cell carrier

Carbonic sample analysis

Carbonic sample analysis (Photoresist, polymers, food, oil, fuel etc.

Characterization experiments

Characterization experiments of colloids, aerogels, organic materials and nanoparticles.

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