Marketing Chen
Marketing Cai
We know that the silicon nitride membrane window has the characteristics of low stress and can be applied to different experimental scenarios. So what are the main factors that determine the stress of the silicon nitride membrane window? We collate the relevant content for your reference:
1, deposition rate: deposition rate has a significant effect on the stress of silicon nitride membrane. Too fast or too slow deposition rate may lead to increased stress.
2, deposition temperature: deposition temperature is another important factor affecting the stress of silicon nitride membrane. Different deposition temperatures will lead to differences in the arrangement of atoms inside the membrane, which will affect the size of the stress.
3, deposition gas concentration: the concentration and type of deposition gas also have a certain impact on the stress of silicon nitride membrane. Different gas concentrations and types will affect the process and result of gas reaction, and then affect the stress of the membrane.
4, plasma density: in the PECVD process, the plasma density and energy state have a significant impact on the growth and stress of silicon nitride membrane. The change of plasma density will affect the velocity and efficiency of the gas phase reaction and thus affect the stress of the membrane.
5, membrane structure impurities: impurities or defects in the membrane structure may also lead to stress. These impurities or defects will destroy the equilibrium state of the atoms inside the membrane, causing an increase in stress.
To sum up, in order to control the stress of the silicon nitride membrane window, the growth process of the membrane can be controlled by optimizing the process parameters and selecting materials, so as to reduce the stress. At the same time, the selection of high quality raw materials and advanced preparation technology can also improve the performance and stability of silicon nitride membranes. The silicon nitride membrane window provided by YWMEMS has the characteristics of low stress and high cleanliness, which can meet the scientific experiments of major universities and scientific research institutions.